TY - GEN
T1 - Construcción de equipo de recubrimiento por centrifugación de bajo costo para deposición de películas delgadas de TiO2 sobre diferentes sustratos
AU - Rojas-Flores, S.
AU - Pajares-Huallan, L.
AU - Rodriguez-Yupanqui, M.
AU - Angelats-Silva, Luis
AU - Leon-Leon, H.
AU - Gallozzo-Cardenas, M.
N1 - Publisher Copyright:
© 2020 Latin American and Caribbean Consortium of Engineering Institutions. All rights reserved.
PY - 2020
Y1 - 2020
N2 - A device for the manufacture of thin films by coating was constructed by centrifugation (spin coating). A timer motor was used to control the constant speeds of 1000 to 6000 rpm for 100 s. which were measured with an optical tachometer. TiO2 films manufactured by the team were deposited on three different substrates (ITO, Si and glass), annealed at 500 ° C after the tenth layer, in order to improve their structure. The films were characterized by a scanning electron microscope (MEB), X-ray diffractogram (DRX) and Fourier transform Infrared (FTIR). The DRX shows that all films have pure anatase structure, with a preferential growth in the peak (101), the FTIR shows the vibration mode in the 433 cm-1 peak belonging to the anatase phase. The results of the MEB show the thicknesses of the films are in the order of nanometers, the TiO2 films deposited on Si those having a thickness of 332.10 nm, less than half compared to the other two. It is concluded that it was possible to build a low-cost spin coating equipment verified with the manufacture of uniform TiO2 films.
AB - A device for the manufacture of thin films by coating was constructed by centrifugation (spin coating). A timer motor was used to control the constant speeds of 1000 to 6000 rpm for 100 s. which were measured with an optical tachometer. TiO2 films manufactured by the team were deposited on three different substrates (ITO, Si and glass), annealed at 500 ° C after the tenth layer, in order to improve their structure. The films were characterized by a scanning electron microscope (MEB), X-ray diffractogram (DRX) and Fourier transform Infrared (FTIR). The DRX shows that all films have pure anatase structure, with a preferential growth in the peak (101), the FTIR shows the vibration mode in the 433 cm-1 peak belonging to the anatase phase. The results of the MEB show the thicknesses of the films are in the order of nanometers, the TiO2 films deposited on Si those having a thickness of 332.10 nm, less than half compared to the other two. It is concluded that it was possible to build a low-cost spin coating equipment verified with the manufacture of uniform TiO2 films.
KW - Anatase
KW - Film deposition
KW - Spin coating
KW - Substrate
KW - Titanium dioxide
UR - http://www.scopus.com/inward/record.url?scp=85096743217&partnerID=8YFLogxK
U2 - 10.18687/LACCEI2020.1.1.15
DO - 10.18687/LACCEI2020.1.1.15
M3 - Contribución a la conferencia
AN - SCOPUS:85096743217
T3 - Proceedings of the LACCEI international Multi-conference for Engineering, Education and Technology
BT - 18th LACCEI International Multi-Conference for Engineering, Education Caribbean Conference for Engineering and Technology
T2 - 18th LACCEI International Multi-Conference for Engineering, Education Caribbean Conference for Engineering and Technology: "Engineering, Integration, and Alliances for a Sustainable Development" "Hemispheric Cooperation for Competitiveness and Prosperity on a Knowledge-Based Economy", LACCEI 2020
Y2 - 27 July 2020 through 31 July 2020
ER -